Carbochlorination Reduction of Silica Oxides

"The carbochlorination of several silica materials was carried out in the temperature range from 900 °C to 1200 °C. In this study, silica oxides and gaseous chlorine with carbon as reductant were used. The optimal carbon silica mole ratio in different temperature was calculated by Factsage software and the results showed that the optimal values are 1.2, 1.4, 1.6, 1.8 at 900 °C, 1000 °C, 1100 °C, 1200 °C, respectively. According to the experiments, the chlorination ratios of several silica materials were increased with temperature increasing. In the same temperature, the chlorination ratio of diatomite is the maximum and the chlorination ratio reaches 79%% when C/SiO2 reaches 3 at 1100 °C.1, IntroductionPolycrystalline silicon is the main material to manufacture the silicon polished section, solar battery[1] and high purity silicon wafers[2], also which is the most basic function material of semi-conductor industry, electronic information industry and solar photovoltaic battery industry[3]. The conventional manufacturing process of polycrystalline silicon would be divided into three parts: the improved Siemens method, which was introduced and became the main process to produce the polysilicon products in China. Silane method and fluidized bed method. Silicon tetrachloride and chlorosilans have been employed as by-products in several fields like electronic, telecounications and metallurgy[4-6]• At present, the main applications of silicon tetrachloride include production of trichlorosilane by catalytic hydrogenation, synthesis of fumed silica and ethyl orthosilicate, production of optical fiber grade silicon tetrachloride.The conventional routes for the silicon tetrachloride production have been reported, including the direct chlorination and the chlorination process of ferrosilicon, abandon catalyst and silica[7]."