Computational Study of Texture Development during Templated Grain Growth

"Development of crystallographic texture in polycrystals during templated grain growth process is studied by phase field modeling and computer simulation. To characterize the grain texture development, X-ray diffraction peak intensities are computed for the evolving grain structures as simulated by the phase field model, based on which Lotgering factor is further calculated as a quantitative measurement of uniaxial texturing. While the phase field modeling allows direct comparison between simulated grain structures and experimental microscopy observations, the computational diffraction allows convenient correlation between computer simulation and experimental X-ray diffraction characterization. The latter feature is especially desirable, since microscopy experiments normally require more efforts than X-ray diffraction, and diffraction is usually the preferred choice for material characterization.IntroductionThe properties of individual grains in polycrystals are generally anisotropic, while untextured polycrystalline materials with random grain orientations exhibit isotropic macroscopic properties that are independent of directions. In order to achieve anisotropic response in polycrystals, crystallographic texturing of grains is required [1]. Texture refers to the collective distribution of grain orientations towards preferred orientation in a polycrystal. To develop texture, special processing routes are needed, such as templated grain growth (TGG) for uniaxial texture [2]. TGG has been shown to provide uniaxial texture in wide variety of materials. For example, [001]-textured ferroelectric polycrystalline ceramics have been fabricated by TGG process, which exhibit enhanced piezoelectric properties [3]. Such highly textured polycrystalline materials offer better cost-performance ratio than single crystals. Thus, texture development in polycrystals is of technological importance for material applications.In this computational work, grain texture development in polycrystals during TGG process is studied. Grain structure evolution is simulated by phase field model, X-ray diffraction peak intensities for the evolving grain structures are computed, and Lotgering factor is calculated to quantitatively measure the development of uniaxial texturing. The phase field modeling allows direct comparison between simulated grain structures and experimental microscopy observations using imaging techniques such as scanning electron microscopy or optical microscopy. The computational diffraction allows convenient correlation between computer simulation and experimental X-ray diffraction characterization. The latter feature is especially desirable, because microscopy experiments normally require more efforts than X-ray diffraction, thus diffraction is usually the preferred choice for material characterization."