Field Emission from CVD Diamond Fabricated by Pulse-Modulated Microwave Plasma

"Electric field emission properties from CVD diamond fabricated using pulse-modulated microwave plasma CVD were studied. Diamond was synthesized by microwave plasma CVD apparatus equipped with a pulse-modulated microwave power supply. Pulse conditions were varied from 1 to 10 seconds for pulse periods and from 0.1 to lHz for pulse frequency either. Surface morphologies of the deposits were differed by pulse frequency and duty cycle. As a result, FE properties prepared by different pulse duty cycle were different from continuous film which synthesized using continuous microwave significantly. Highest current density was obtained from the uneven morphology diamond film prepared at 17.5% pulse duty cycle.FE properties of the CVD diamond were depended on surface morphologies that related to the pulse conditions.1. IntroductionDiamond has excellent physical and chemical properties as an industrial material. Especially, hydrogen terminated diamond had the negative electron affinity (NEA) 1) and CVD diamond has this NEA property either as deposited 2). So the electron emission source to the FED is expected as one of this application of CVD diamond as cold cathode of electric devices. We studied on FE properties of various CVD diamond, pulse microwave plasma CVD diamond showed better property than those of other CVD diamond 3).This report studied on· the effect of the duty-cycle of pulse modulate microwave condition on FE properties of the diamond fabricated by pulse modulated microwave plasma CVD."