Formation of Hydrogen Absorption Film by Electrodeposition in Molten Salts

"Hydrogen absorption alloy films have been produced by molten salt electrolysis. Lanthanum-Nickel alloy film can be formed on a nickel substrate in KCl-NaCl-LaCb molten salts by electrolysis diffusion process. LaNi5 alloy was formed by mutual diffusion between La ·and Ni after La deposition on Ni substrate. Though several kinds of La-Ni compound existed in deposits, the alloy compounds on Ni substrate changed by electrolysis condition. According to the open-circuit potential measurement in molten salts after La electrodeposition, the formed compounds had a relation to the potential. In the case of the substrate electroplated a cobalt thin film on nickel, LaNi4_5Co0.5 was formed by the electrolysis in the molten salts with lanthanum ions. This ternary alloy film showed better hydrogen absorption behavior in cyclic charge/discharge test in alkaline solution.IntroductionHydrogen storage alloys have attracted attention as the active materials for batteries with the charge/discharge property at ambient temperature. The alloy of nickel and misch metal, mainly consisting of La and Ce, has been commercially 'used as a metal hydride with rechargeable property. In recent years, researches have been developed many kind of new alloys with better hydrogen absorption properties. The hydrogen absorbing alloy ingots are commonly produced by melting method of both metals in furnace, otherwise, prepared by mechanical grinding and metallurgical sintering technique with metal powders. The film is also made by vapor-phase techniques such as sputtering method, ion plating method, etc. ·We have proposed a new method to produce hydrogen absorbing alloy films by molten salts electrolysis technique [1-3]. The hydrogen absorbing film, LaNi5, Mg2Ni and CaNi5, were obtained in this process through controlling the electrolytic condition. The active metals, La, Mg and Ca, are electrodeposited on Ni substrate, diffuse into the substrate and form various kinds of intermetallic compounds. This technique provides a direct process using metal chlorides as resources to produce functional films without using active metals such as La, Ca and Mg."