Increasing Oxygen Charge Transfer Resistance on the Anode in Copper Electrowinning

"Oxygen evolution is the main anode reaction in industrial copper electrowinning. The oxygen bubbles do not conduct electricity, thus increasing the electrolyte resistance. The oxygen bubbles formed at the anode rise to the surface, occupying a larger volume of the electrolyte at the top of the cell than at the bottom. This oxygen bubble concentration gradient contributes to a gradient in electrolyte resistance and consequently a tendency toward uneven current distribution. This phenomenon increases the chance for uneven growth on the cathode and/or short-circuits, particularly on the lower portions of the cathode. This issue may be ameliorated by increasing the charge transfer resistance for oxygen evolution down the height of the anode. This concept was studied by solving the current distribution for a 2-D model of a copper electrowinning cell using COMSOL.IntroductionA copper electrowinning tankhouse aims to operate at the highest current density that will deposit on the cathode a layer of copper metal possessing the desired physical and chemical characteristics. The operating current density is directly related to the physical nature of the copper deposit on the cathode (Figure 1), limiting a copper electrowinning tankhouse to some operating current density that produces acceptable copper deposits.[!] The ratio of the operating current density to the limiting current density is typically around 0.3.[2] If the limiting current density for a cell could be raised, the operating current density could also be raised and thus result in savings in capital cost for a tankhouse. [3]The average operating current density in a copper electrowinning plant is 270A·m- 2 .[4] The value for average current density, however, obscures the fact that the face of a cathode does not experience this value equally. Indeed, the current density varies along the height of an electrode and is independent of the height of the electrode.[5] This phenomenon partly explains why the lower portions of a cathode tend to display a rougher copper deposit.In order to utilize a higher operating current density but still remain at 30% of the limiting current density, the limiting current density must be raised, but it is affected by the mass transfer regime at the electrodes. The mass transfer regime is currently poorest at the lower portions of the cathode and this is part of the reason for the tendency for poor cathode deposits to occur at the lower portion of the cathode.[6]"