Particle Attachment and Detachment in the Presence of Linear Polyphosphates

Society for Mining, Metallurgy & Exploration
Adam Feiler John Ralston
Organization:
Society for Mining, Metallurgy & Exploration
Pages:
10
File Size:
372 KB
Publication Date:
Jan 1, 2003

Abstract

Optical reflectometry was used to study the attachment and subsequent detachment of silica particles (diameter 25 nm) from the surface of titanium dioxide wafers under well-defined hydro- dynamic conditions. Atomic force microscopy was used to measure the interaction between silica spheres (diameter 7 pm) and titanium dioxide wafers under the same solution conditions. In addition to repulsive electrical double layer forces, adsorbed polyphosphates provide a short-ranged steric layer that reduces the lateral interaction between the surfaces. The use of these two complementary techniques has given valuable insight into the process responsible for fine particle detachment and has particular application to surface cleaning.
Citation

APA: Adam Feiler John Ralston  (2003)  Particle Attachment and Detachment in the Presence of Linear Polyphosphates

MLA: Adam Feiler John Ralston Particle Attachment and Detachment in the Presence of Linear Polyphosphates. Society for Mining, Metallurgy & Exploration, 2003.

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