Synthesis of Advanced Composite Oxides Thin Films by the Liquid Phase Deposition Method from Aqueous Solution

"A new wet process has been developed for the synthesis of various kinds of oxide thin films on various kinds of substrates, even which have complex surface morphology, from aqueous solution. The process was named as the LPD, Liquid Phase Deposition, method, which has some advantages over the conventional dry processes. This process can be applied to an on-site synthesis of advanced materials in the thin film technology. In this paper, some current topics on the synthesis of the composite thin oxide films by the LPD method, are presented.IntroductionGenerally, metal oxide thin films have been made by different preparative processes such as r.f. sputtering, chemical vapor depositon, CVD, laser ablation and sol-gel method, etc [1-3]. Each method has it own advantages and disadvantage. In some cases, the process is not suitable for the preparation of thin film on substrate with large surface area or complex surface morphology, and makes the deposition apparatus complicated and expenisve. By using Liquid Phase Deposition, LPD, method which overcomes some of those problems, metal oxide or hydroxide thin film can be formed on the substrate with large surface area and complex surface morphology, which are immersed into the aqueous solution only at ambient temperature and under atmosphere without any special equipments and high energy. And also, multicomponent oxide thin films can be formed readily by mixing solutions containing the objective metal ions, because it is performed in the aqueous solution which is typically a homogeneous mixing system. This process utilizes ligand-exchange, hydrolysis, equlibrium reaction of metal-fluoro complex species, MF x (x-2n>-, and F consumptive reaction. In the aqueous solution, MFx<x-2n>-is hydrolyzed with water to release F ions by a ligand exchange equilibrium reaction as following;"